Is a space-saving device designed for cleaning and etching of the silicon wafers. Device Features: Used materials comply with the FM4910 standards Etching and rinsing bath. One to three storage positions. Fully automated; Automatic transport of the Si-wafers to the process and rinse bath, and even procedural motions (agitations) of the Si-wafers in that baths. Choice of the process recipes (process times, temperatures, the order of the passing through wafers (agitations), etc.). Measurement of the conductivity and flow rate of rinse demi-water Nitrogen bubbling and workplace exhaustion.
(The equipment is used by U.S. customer in Czech Republic.)