A set of six identical chemical boxes to etch and wash silicon wafers of 150 - 200 mm in diameter under laboratory conditions. Tubs for chemical processes are manually operated, temperature of the PVDF tub is controllable. Rinse tubs are equipped with automatic quick...
A hood for laboratory purposes and for work with inorganic and organic acids. Tubs for chemical process are manually operated and individual waste chemicals are collected into separate boxes. The hood is connected to a central distribution system for nitrogen, vacuum...
The cartridge filling device is a single-purpose device used in health service. Containers are manually loaded into the machine and filled with three different medical solutions. The equipment is designed for work in clean rooms as per ISO 14644-1, class 8. HIGHLIGHTS...
The machine is designed as a single-purpose piece of equipment for clean rooms in semiconductor industry. The machine provides jet etching, washing and edge drying of silicon wafers for power switches. The equipment consists of two chambers with controlled flow of the...
The table tampo-print 360° is a minor single-purpose device for printing catheters which are used in the health service. Catheters are loaded manually into the bed under a transparent cover. The ink is transferred on the catheter using a swab which subsequently rolls...
Is a space-saving device designed for cleaning and etching of the silicon wafers. Device Features: Used materials comply with the FM4910 standards Etching and rinsing bath. One to three storage positions. Fully automated; Automatic transport of the Si-wafers to the...
The automatic equipment is used to etch and clean monocrystalline silicon ingots in the semiconductors manufacturing. Individual ingots of cylindrical shape are placed in a basket on the incoming conveyor belt. Having the cover of the incoming conveyor belt been...
The equipment is a chemical box to clean and etch monocrystal silicon wafers in the chemical SC-1 and in hydrofluoric acid. The operator places baskets with silicon wafers of diameter equal to 4 up to 8“ into individual tubs. Having the required etching time been...
The equipment is designed to etch Si plates in manufacture of semiconductors. It is designed as a stand-alone chemical box. The etching is done by means of chemicals based on hydrofluoric acid. All materials used are chemically resistant and they meet the requirements...
The machine is designed as a single-purpose automatic box to etch Si plates. The cycle of etching and rinsing the Si plates is fully automatic according to the selected parameters, the operator only replenishes the incoming material, takes products and selects the...
The equipment is a set of four chemical sections interconnected in a manufacturing line. The line makes it possible to carry out an automatic comprehensive chemical procedure on wafers from monocrystalline silicon. The procedure typically consists of etching sequences...
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The machine is used to etch facets of semiconductor wafers (up do the diameter of 4“) with a mixture of nitric acid, hydrofluoric acid and acetic acid. After the etching process is over, the wafers are rinsed in a triple upstream cascade with demineralised water and...
The equipment is used as laboratory box to work with aggressive chemicals. The main part is represented with a working area with a chemically resistant polypropylene worktop and with illumination. The worktop contains three sinks, each is connected to an independent...
The machine is designed for degreasing and drying of aluminium foils in semiconductor industry. Degreasing is done in several baths with toluene acetone and ethanol with support of ultrasound for increased efficiency of the cleaning. At the end of the process the...
Compact device designed for etching of the quartz (silica glass) tubes in a hydrofluoric acid and subsequent washing in a demi-water. Device Features: Processed tube diameter up to 300mm and tube length up to 2450mm Built-in sprays (washing system) Workplace...
The device is designed to wash the canisters and shipping boxes from Spraying chemicals DI water from the inner and outer parts. The equipment is used for the needs of the semiconductor industry. Skeleton device is made of white polypropylene. (The equipment is used...
The machine is designed for etching of the edges of the silicon wafers and following proceses of rinsing and drying. Etching and rinsing is done by jets with optional position and angle to the wafer. After manual insertion the wafers are automatically centered on the...
The device is designed for cleaning and washing of the semiconductor tubes and other small parts in the semiconductor industry. You can etch into the tube diameter of 300 mm and a length of 1450-2765 mm. Manipulator situates tube on a rotating cylinders (roller beam)....
The equipment is designed for use in the optoelectronic industry and to operate in clean rooms. Chemical cabinet is used for washing and etching sapphire wafers by chemical solutions in the baths. A diameter of the wafer can be 2"- 8". Wafers are stored in PFA...
Designed for fully automatic cleaning of silicon monocrystals. Device Features: Processing of one or two ingots with a total weight up to 30 kg Input and output conveyor with handling baskets, two-axis manipulator Barcode reader of a loaded batch Three process baths:...
The equipment is used for an automatic process of etching and cleaning small Si-wafers for research tasks in various process chemicals. The operator will prepare loads of etching baths and will place the baskets with silicon substrates sized 2" in positions for...
The equipment is an automatic chemical line designed for manufacture of semiconductors and is used for the technological process which consists in etching Si-wafers with a mixture of acids. The operator will place a basket with silicon substrates sized 8" into a...