A set of six identical chemical boxes to etch and wash silicon wafers of 150 - 200 mm in diameter under laboratory conditions. Tubs for chemical processes are manually operated, temperature of the PVDF tub is controllable. Rinse tubs are equipped with automatic quick...
The equipment is designed to etch Si plates in manufacture of semiconductors. It is designed as a stand-alone chemical box. The etching is done by means of chemicals based on hydrofluoric acid. All materials used are chemically resistant and they meet the requirements...
The equipment is intended for medical purpose and for use in environments with high hygiene requirements. The equipment is made of polished stainless steel; dimensions: 250 x 350 mm, height – 250 mm. (The equipment is used by Czech customer in Czech Republic.)
The equipment is used for an automatic process of etching and cleaning small Si-wafers for research tasks in various process chemicals. The operator will prepare loads of etching baths and will place the baskets with silicon substrates sized 2" in positions for...